Sequential infiltration synthesis system

Sequential infiltration synthesis method is used to infiltrate block copolymer matrices with the metal oxides. Gaseous precursors are introduced sequentially to the reaction chamber, where they chemically bound with specific functional groups in order to create oxide replica of a selected copolymer block. In our laboratory we can infiltrate block copolymers with following oxides: aluminium oxide, zinc oxide and tin oxide. We extended capability of our system by measuring the thickness of infiltrated film during an exact process with an optical reflectometer Filmetrics F-20. Also, our setup is suitable to grow films in an atomic layer deposition (ALD) mode. With the specially designed heating mantles we are capable of heating steel cylinders with less volatile compounds.